DEVELOPING METHOD AND DEVELOPING APPARATUS

专利名称：DEVELOPING METHOD AND DEVELOPING

APPARATUS

发明人：Hirofumi TAKEGUCHI,Taro

YAMAMOTO,Kousuke YOSHIHARA

申请号：US12472728申请日：20090527

公开号：US20090311632A1公开日：20091217

专利附图：

摘要：A developing method comprising a developing step in which, while a waferhorizontally held by a spin chuck is being rotated, the wafer is developed by supplying a

developer onto a surface of the wafer, wherein provided before the developing step is apre-wetting step in which, simultaneously with the developer being supplied from a firstnozzle that is located on a position near a central part of the surface of the rotatingwafer, a deionized water as a second liquid is supplied from a second nozzle that islocated on a position nearer to an outer peripheral part of the wafer than the firstnozzle, to thereby spread out the developer in the rotating direction of the wafer by awall that is formed by the deionized water flowing the outer peripheral side of the waferwith the rotation of the wafer. Thus, a wetting property of a surface of a resist filmformed on the wafer that is made hydrophobic can be improved, whereby a developerfilm can be efficiently formed and thus the developing process can be stabilized.

申请人：Hirofumi TAKEGUCHI,Taro YAMAMOTO,Kousuke YOSHIHARA

地址：Koshi-Shi JP,Koshi-Shi JP,Koshi-Shi JP

国籍：JP,JP,JP

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