专利名称：Exposure apparatus and making method
thereof
发明人：Akimitsu Ebihara申请号：US11646499申请日：20061228公开号：US08953148B2公开日：20150210
专利附图：
摘要：An exposure apparatus that forms a pattern by exposing a substrate isequipped with a first platform tower, a second platform tower installed at apredetermined distance, and an exposure main section arranged within the space
between both platform towers that includes a plurality of high rigidity sections eachincluding a high rigidity component. Accordingly, it becomes possible to use a module (ahigh rigidity section) of the preceding generation even when the generation changes.
申请人：Akimitsu Ebihara
地址：Fukaya JP
国籍：JP
代理机构：Oliff PLC
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