专利名称:Stacked integrated circuit and capacitor
structure containing via structures
发明人:Matthew S. Buynoski申请号:US094882申请日:20000120公开号:US052250B1公开日:20020917
专利附图:
摘要:An integrated circuit structure includes a planar capacitor positioned adjacentto a logic circuit implemented on a silicon die. The silicon die is bonded to a mountingbase using controlled collapse chip connection methods such that a ground terminal of
the silicon die is coupled to a ground trace in the mounting base and a Vdd terminal ofthe silicon die is coupled to a Vdd trace in the mounting base. The capacitor includes viastructures with controlled collapse chip connection structures for bonding to themounting base directly above the silicon die and coupling a first charge accumulationplate to the Vdd trace and a second charge accumulation plate to the ground trace.
申请人:ADVANCED MICRO DEVICES, INC.
代理机构:Renner, Otto, Boisselle & Sklar, LLP
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