BANDPASS FILTER AND MULTISTEP BANDPASS FILTER

专利名称：BANDPASS FILTER AND MULTISTEP

BANDPASS FILTER

发明人：HASEGAWA TAKEHIRO,長谷川 雄大,KAN

YASUSHI,官 寧

申请号：JP2017149257申请日：20170801公开号：JP2019029898A公开日：20190221

专利附图：

摘要：To provide a bandpass filter in which fine-tuning of resonance frequency ispossible after manufacture by using an SIW.SOLUTION: A bandpass filter includes a

substrate, a first conductor layer, a second conductor layer, and a post wall. The

substrate has a first surface and a second surface facing the first surface, and is formed ofa dielectric material. The first conductor layer covers the first surface, and is formed tohave an opening. The second conductor layer covers the second surface. The post wallpenetrates the substrate from the first surface toward the second surface, and is formedof multiple conductor posts electrically connected with the first and second conductorlayers. The post wall is arranged to surround the opening in the plan view. The firstconductor layer has a primary part surrounding the opening, an inner conductor partformed in the opening while spaced apart from the primary part, and a connection partfor electrically connecting the primary part and the inner conductor part. The firstconductor layer has a slot sectioned by the primary part, the inner conductor part andthe connection part.SELECTED DRAWING: Figure 1

申请人：FUJIKURA LTD,株式会社フジクラ

地址：東京都江東区木場１丁目５番１号

国籍：JP

代理人：棚井 澄雄,五十嵐 光永,小室 敏雄,清水 雄一郎

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