专利名称:Antireflective coating, coating composition,
and antireflective coated article
发明人:Masaaki Yamaya,Kazuharu Sato申请号:US11244154申请日:20051006公开号:US07270887B2公开日:20070918
摘要:An antireflective coating having improved alkali resistance is formed on atransparent substrate of synthetic resin as an outermost layer and has a three-dimensional crosslinked structure containing F and Si atoms. The crosslinked structure iscomposed of Si—O—Si and Si—CH—(CF)—CH—Si linkages wherein n is 4 or 6; the molarratio of F atoms to Si atoms is from 8.0 to 10.0; and perfluoroalkyl groups account for 90to 100 mol % of all monovalent organic substituent groups attached to silicon atoms.The antireflective coating can exhibit such alkali resistance that when a droplet of a 1 wt% NaOH aqueous solution is rested on the antireflective coating for 30 minutes and thenwiped off, the appearance of the coating is kept unchanged from the initial appearance.
申请人:Masaaki Yamaya,Kazuharu Sato
地址:Usui-gun JP,Usui-gun JP
国籍:JP,JP
代理机构:Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
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