SYSTEM AND METHOD FOR INTRODUCING A SUBSTRATE INTO

专利名称：SYSTEM AND METHOD FOR INTRODUCING

A SUBSTRATE INTO A PROCESS CHAMBER

发明人：In Taek LEE申请号：US12712533申请日：20100225

公开号：US201001478A1公开日：20100617

专利附图：

摘要：A system and method for introducing a substrate into a process chamber isprovided. A presence or absence of a substrate on a stage in an apparatus formanufacturing a semiconductor or a flat panel display may be determined by lift pins

used for loading and unloading a substrate, the introduction of another substrate may beprevented and a broken state or the erroneously loaded state of the substrate may bedetected. An opening or closing of a gate valve may also be determined, and theintroduction of a substrate into the process chamber may be prevented while the gatevalve is closed.

申请人：In Taek LEE

地址：Incheon KR

国籍：KR

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