OPTICAL PROXIMITY CORRECTION CONVERGENCE CONTROL

专利名称：OPTICAL PROXIMITY CORRECTION

CONVERGENCE CONTROL

发明人：Cheng-Cheng Kuo,Ching-Che Tsai,Tzu-Chun

Lo,Chih-Wei Hsu,Hua-Tai Lin,Tsai-ShengGau,Wen-Chun Huang,Chih-ShiangChou,Hsin-Chang Lee,Kuei Shun Chen

申请号：US133619申请日：20120208

公开号：US20130205265A1公开日：20130808

专利附图：

摘要：A method of optical proximity correction (OPC) convergence control thatincludes providing a lithography system having a photomask and an illuminator. Themethod further includes performing an exposure by the illuminator on the photomask.Also, the method includes optimizing an optical illuminator setting for the lithographysystem with a defined gate pitch in a first direction in a first template. Additionally, themethod includes determining OPC correctors to converge the OPC results with a targetedge placement error (EPE) to produce a first OPC setting for the first template. The firstOPC setting targets a relatively small EPE and mask error enhancement factor (MEEF)ofthe defined gate pitch in the first template. In addition, the method includes checking thefirst OPC setting for a relatively small EPE, MEEF and DOM consistency with the firsttemplate of the defined gate pitch in a second, adjacent template.

申请人：Cheng-Cheng Kuo,Ching-Che Tsai,Tzu-Chun Lo,Chih-Wei Hsu,Hua-Tai Lin,Tsai-Sheng Gau,Wen-Chun Huang,Chih-Shiang Chou,Hsin-Chang Lee,Kuei Shun Chen

地址：Baoshan Township TW,Zhubei City TW,New Taipei City TW,Zhubei CityTW,Hsinchu City TW,Hsinchu City TW,Tainan City TW,Pingzhen City TW,Hsin-Pu ZhenTW,Hsin-Chu TW

国籍：TW,TW,TW,TW,TW,TW,TW,TW,TW,TW

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