Method of forming inorganic alignment film, inorga

专利名称：Method of forming inorganic alignment film,

inorganic alignment film, substrate forelectronic device, liquid crystal panel andelectronic apparatus

发明人：Hidenobu Ota,Yukihiro Endo,Osamu

Iwamoto

申请号：US10931813申请日：20040901公开号：US07170663B2公开日：20070130

专利附图：

摘要：A method of forming an inorganic alignment film on a base substrate isprovided comprising forming a film made substantially of an inorganic material on thebase substrate, and irradiating ion beams onto the surface of the film from a directioninclined at a predetermined angle θwith respect to the direction vertical to the surface.By irradiating the ion beams onto the film, concave portions having a predetermineddirectivity are formed on the film. The predetermined angle θis preferably 2° or more.

申请人：Hidenobu Ota,Yukihiro Endo,Osamu Iwamoto

地址：Suwa JP,Suwa JP,Chino JP

国籍：JP,JP,JP

代理机构：Harness, Dickey & Pierce, P.L.C.

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