Design-based monitoring

专利名称：Design-based monitoring

发明人：Youval Nehmadi,Josephine Phua,Jacob

Joseph Orbon, Jr.,Ariel Ben-Porath,EvgenyLevin,Ofer Bokobza

申请号：US10780377申请日：20040217公开号：US07135344B2公开日：20061114

专利附图：

摘要：A method for monitoring fabrication of an integrated circuit (IC) on asemiconductor wafer includes generating a product design profile (PDP) using an

electronic design automation (EDA) tool, the PDP comprising an indication of a site in atleast one layer of the IC that is susceptible to a process fault. Upon fabricating at leastone layer of the IC on the wafer, a process monitoring tool is applied to perform ameasurement at the site in at least one layer responsively to the PDP.

申请人：Youval Nehmadi,Josephine Phua,Jacob Joseph Orbon, Jr.,Ariel Ben-Porath,Evgeny Levin,Ofer Bokobza

地址：Modiin IL,San Jose CA US,Morgan Hill CA US,Gealya IL,Cupertino CAUS,Cupertino CA US

国籍：IL,US,US,IL,US,US

代理人：Tarek N. Fahmi

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