专利名称：Pattern formation
发明人：Barr, Robert K.,Knudsen, Philip D.,Sutter,
Thomas C.
申请号：EP04256113.4申请日：20041002公开号：EP1524553A2公开日：20050420
摘要：A repelling barrier composition is selectively applied to a substrate followed byapplying a radiant energy sensitive material to spaces or channels formed by the barriercomposition. The repellent barrier composition repels the radiant energy sensitivematerial such that it is directed into the spaces or channels formed by the barriercomposition. The repellent barrier composition is removed to form a pattern on thesubstrate.
申请人：Rohm and Haas Electronic Materials, L.L.C.
地址：455 Forest Street Marlborough, Massachusetts 01752 US
国籍：US
代理机构：Kent, Venetia Katherine
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