专利名称：PROCESS MONITORING USING CRYSTAL
WITH REACTANCE SENSOR
发明人：Mohamed Buhary Rinzan申请号：US15461959申请日：20170317
公开号：US20180267086A1公开日：20180920
专利附图：
摘要：Devices, systems and methods for process monitoring are presented. Forinstance, the device includes a crystal and a reactance sensor. The crystal is connected toa frequency measurement circuit. The reactance sensor is connected to the crystal. The
reactance sensor is configured to detect a change in a process parameter. The frequencymeasurement circuit detects the change in the process parameter as a change in thefrequency of the crystal. In another example, the system includes a reactance sensor anda measurement device. The reactance sensor is disposed in a process chamber, and has avariable reactance responsive to a change in a process parameter. The measurementdevice is disposed outside the process chamber and has a frequency measurement circuit.The frequency measurement circuit includes a crystal and is connected to the reactancesensor, and detects the change in the process parameter as a change in the frequency ofthe crystal.
申请人：INFICON, Inc.
地址：East Syracuse NY US
国籍：US
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