专利名称：MANUFACTURING METHOD OF ARRAY
SUBSTRATE, ARRAY SUBSTRATE AND LCDDEVICE
发明人：Jun Wang申请号：US13579068申请日：20120712
公开号：US20140001475A1公开日：20140102
专利附图：
摘要：A manufacturing method of the array substrate includes the steps: A. A firstmask manufacturing process is adopted to from scan lines and thin film transistor (TFT)
gates on a surface of a substrate. B. A second mask manufacturing process is adopted toform scan lines and data lines of the array substrate, a source electrode and a drainelectrode of TFT and a conducting channel positioned between the source electrode andthe drain electrode. C. A photoresistor formed in the second mask manufacturing
process is incinerated, and then, an a-Si film is paved on the surface of the array substrate.D. The photoresistor is stripped to form an undoped active layer. E. A third mask
manufacturing process is adopted to form a transparent conducting layer on the surfaceof the drain electrode of the TFT. Only three mask manufacturing process in the presentdisclosure are needed to manufacture the entire array substrate.
申请人：Jun Wang
地址：Shenzhen CN
国籍：CN
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