MANUFACTURING METHOD OF ARRAY SUBSTRATE, ARRAY SUB

专利名称：MANUFACTURING METHOD OF ARRAY

SUBSTRATE, ARRAY SUBSTRATE, ANDDISPLAY DEVICE

发明人：CAO, Zhanfeng,ZHANG, Feng,ZHANG, Bin,HE,

Xiaolong,LI, Zhengliang,ZHANG, Wei,GUAN,Feng,GAO, Jincheng

申请号：EP16813052.4申请日：20160309公开号：EP3355346A1公开日：20180801

专利附图：

摘要：The present disclosure relates to a manufacturing method of an array

substrate, an array substrate and a display device. The manufacturing method comprisessequentially depositing a first electrode layer and a gate metal layer on a base substrate,the first electrode layer including at least two conductive layers, formation materials ofthe at least two conductive layers having different etching rates; forming a photoresistlayer on the gate metal layer; exposing and developing the photoresist layer using ahalftone mask plate; performing a first etching process on the gate metal layer; etchingthe first electrode layer; ashing the photoresist layer, performing a second etchingprocess on the gate metal layer by using remaining photoresist layer as a mask, strippingthe remaining photoresist, and sequentially forming a semiconductor layer, a source anddrain electrode layer, a via-hole and a second electrode layer on the gate metal layer onwhich the second etching process has been performed.

申请人：BOE Technology Group Co., Ltd.

地址：No. 10 Jiuxianqiao Rd. Chaoyang District Beijing 100015 CN

国籍：CN

代理机构：Jacobacci Coralis Harle

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