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MANUFACTURING METHOD OF ARRAY SUBSTRATE, ARRAY SUB

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专利名称:MANUFACTURING METHOD OF ARRAY

SUBSTRATE, ARRAY SUBSTRATE ANDDISPLAY DEVICE

发明人:Shuang SUN,Fangzhen ZHANG,Jing NIU申请号:US14436995申请日:20140820

公开号:US20160148954A1公开日:20160526

专利附图:

摘要:The present invention provides an array substrate and a manufacturing methodthereof and a display device. The manufacturing method comprises: forming a pattern

including a pixel electrode and a source of a thin film transistor on a base substratethrough a single patterning process, the pixel electrode is provided in a layer under alayer in which the source is located; forming a pattern including a drain, an active layer, agate insulation layer and a gate of the thin film transistor through a single patterningprocess, the active layer covers the source and the drain, and is separated from the gatethrough the gate insulation layer; and forming a pattern including a passivation layer, acommon electrode and a gate line through a single patterning process, the commonelectrode is a slit electrode and separated from the active layer and the pixel electrodethrough the passivation layer.

申请人:BOE TECHNOLOGY GROUP CO., LTD.

地址:Beijing CN

国籍:CN

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