专利名称：Method And Apparatus For Observing A
Specimen
发明人：Atsushi MIYAMOTO,Maki Tanaka,Hidetoshi
Morokuma
申请号：US12110443申请日：20080428
公开号：US20080237456A1公开日：20081002
专利附图：
摘要：A method and device for observing a specimen, in which a convergent electronbeam is irradiated and scanned from a desired direction, on a surface of a calibration
substrate on which a pattern with a known shape is formed, and a beam SEM image of thepattern formed on the calibration substrate is obtained. An actual direction of theelectron beam irradiated on the surface of the calibration substrate is calculated by useof the information about an apparent geometric deformation of the known shape on theSEM image, and the actual direction of the electron beam to the desired is adjusteddirection by using information of the calculated direction. The pattern with the knownshape formed on the calibration substrate has a crystal plane formed by anisotropicchemical etching
申请人：Atsushi MIYAMOTO,Maki Tanaka,Hidetoshi Morokuma
地址：Yokoham JP,Yokohama JP,Hitachinaka JP
国籍：JP,JP,JP
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