POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY PLA

专利名称：POLYMERIC ANTIREFLECTIVE COATINGS

DEPOSITED BY PLASMA ENHANCEDCHEMICAL VAPOR DEPOSITION

发明人：SABNIS, Ram, W.,SHIH, Wu-Sheng申请号：EP03719720.9申请日：20030411公开号：EP1493061B1公开日：20101117

摘要：An improved method for applying polymeric antireflective coatings to substratesurfaces and the resulting precursor structures are provided. Broadly, the methodscomprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the

substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprisesubjecting the monomers to sufficient electric current and pressure so as to cause themonomers to sublime to form a vapor which is then changed to the plasma state byapplication of an electric current. The vaporized monomers are subsequently

polymerized onto a substrate surface in a deposition chamber. The inventive methods areuseful for providing highly conformal antireflective coatings on large surface substrateshaving super submicron (0.25 µm or smaller) features. The process provides a muchfaster deposition rate than conventional chemical vapor deposition (CVD) methods, isenvironmentally friendly, and is economical.

申请人：BREWER SCIENCE INC

地址：US

国籍：US

代理机构：UEXKÜLL & STOLBERG

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